磨料的粒径大小、硬度、粒径分布均一性等因素对抛光研磨去除率起着重要作用。在对抛光液的磨料粒径进行考察时，主要评估其平均粒径大小，大颗粒、小颗粒浓度等指标。 HM&M珠磨机 HM&M珠磨机是通过研磨珠与物料的高剪切和高碰撞力将物料尺寸粒径磨小并更 ...

因应 AI 半导体需求扩大，日厂富士软片（Fujifilm）将投资 20 亿日圆扩增熊本工厂生产设备，将先进半导体材料「研磨液」（CMP Slurry）产能扩增 3 成。 富士软片5日发布新闻稿宣布，为了因应AI半导体需求扩大、来自亚洲的需求增加，将进一步扩大半导体材料事业 ...

Sinmat is a leader in CMP slurries for the fast growing SiC and GaN markets Sinmat is a leader in the design and production of Chemical Mechanical Planarization (CMP) slurries used for polishing ultra ...

Chemical Mechanical Polishing (CMP) is a key process in high-density integrated circuits production, where CMPs are utilized during various stages for normally short periods of time. Hence, CMPs need ...

20世纪90年代初期，光刻对平坦度日益迫切的要求，催生了化学机械平坦化（CMP）工艺，它开始被用于后端（BEOL）金属连线层间介质的平整，当时还是一个不被看好的丑小鸭。然而随着时光的流逝，丑小鸭却越来越显现出她独特的魅力。 20世纪90年代中期，浅槽 ...

In this interview, Mark Bumiller, Technology Manager for Entegris talks to AZoM about using the Accusizer to detect large particles counts in CMP slurries. Please could you give us an introduction to ...

BILLERICA, Mass.--(BUSINESS WIRE)--Entegris, Inc. (Nasdaq: ENTG), a leader in specialty chemicals and advanced materials solutions, announced today it has acquired Sinmat, a CMP slurry manufacturer.

Suppliers of chemical mechanical planarization (CMP) slurries may be fierce competitors of Cabot Microelectronics, the company considered to be the sector's number one player, but they agree with the ...

At the semicon west semiconductor equipment and materials trade show in San Francisco last month, competing announcements spelled potential trouble for companies in the fast-growing business of ...

SiC CMP Slurry report published by QYResearch reveals that COVID-19 and Russia-Ukraine War impacted the market dually in 2022. Global SiC CMP Slurry market is projected to reach US$ 177.3 million in ...