Researchers develop universal, nondestructive photolithography method for quantum dot patterning for high-resolution ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

Over the past decade, colloidal quantum dots (QDs) have emerged as promising materials for next-generation displays due to ...

Continuing to rely on 193nm immersion lithography with multiple patterning is becoming much more difficult at 7nm and 5nm. With the help of various resolution enhancement techniques, optical ...

What’s in store for chipmakers at 7nm, 5nm and beyond, and why atomic-level etch and deposition are getting new attention. Prabu Raja, group vice president and general manager for the Patterning and ...

Colloidal quantum dot (QD) light-emitting diodes have great potential in display applications. However, their ...

What's more useful: a quick and easy nanoscale fabrication method that yields lots of loosely assembled products, or a painstaking procedure for making robust structures one molecule at a time? This ...

Self-aligned multi-patterning processes have become a necessity at the most advanced nodes, where traditional litho-etch multi-patterning processes begin to experience alignment control issues, ...