A sensor that requires no nanoscale patterning detects single molecules of a breast cancer protein at concentrations 250 ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

Foundries are finally in production with EUV lithography at 7nm, but chip customers must now decide whether to implement their next designs using EUV-based multiple patterning at 5nm/3nm or wait for a ...

Continuing to rely on 193nm immersion lithography with multiple patterning is becoming much more difficult at 7nm and 5nm. With the help of various resolution enhancement techniques, optical ...

What's more useful: a quick and easy nanoscale fabrication method that yields lots of loosely assembled products, or a painstaking procedure for making robust structures one molecule at a time? This ...

Self-aligned multi-patterning processes have become a necessity at the most advanced nodes, where traditional litho-etch multi-patterning processes begin to experience alignment control issues, ...

Applied Materials AMAT introduced a slew of new products in a bid to boost its patterning solutions portfolio. Notably, the company launched the Sym3 Y Magnum etch system to improve chip performance ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

Background Precise and accurate field methods for body composition analyses in athletes are needed urgently. Aim Standardisation of a novel ultrasound (US) technique for accurate and reliable ...