A layout-dependent circuit-design model from Toshiba helps boost gate density and improve cost-performance in next-generation 45-nm CMOS technology. More specifically, 45-nm CMOS gate density can be 2 ...
Before we plunge headfirst into the fray with gusto and abandon (and aplomb, of course), let’s remind and reassure ourselves that—although the following discussions focus on the devices and ...
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