Producing high-purity wafers via the CMP process is a critical application and the halting of harmful slurry-DIW cross-contamination and back-flow can be optimised with the Malema Interconnect ...

Abstract: High-K Metal Gate (HKMG) is one of the most significant steps in CMOS manufacturing for 28nm node process and beyond. For Metal Gate step to be accurately controlled the Chemical-mechanical ...

Hybrid bonding has been in production for several years, with mature flows capable of delivering robust yields using 10µm interconnects. At that scale, processes can tolerate hundreds of nanometers of ...

Abstract: Tungsten CMP (W CMP) has been broadly applied to the major process for local as well as global planarization of integrated circuits (ICs). W CMP process is drove by chemical interaction. In ...

The Nature Index 2025 Research Leaders — previously known as Annual Tables — reveal the leading institutions and countries/territories in the natural and health sciences, according to their output in ...

Reforming Colorado’s construction defects laws in order to incentivize the building of condominiums and townhomes has emerged as a priority for both Republicans and Democrats early in the legislative ...

Using the latest in aberration-corrected electron microscopy, researchers at the Department of Energy’s Oak Ridge National Laboratory and their colleagues have obtained the first images that ...